光学元件精密加工中的磁流变抛光技术工艺参数

为了充分掌握磁流变抛光中磁场强度、浸入深度、抛光轮转速、磁流变液水分含量等工艺参数对抛光结果的影响规律,以期提高元件的面形精度和表面的质量，在研究了磁流变抛光材料的去除数学模型的基础上,结合实验室的PKC100-P1型抛光设备,对上述的关键工艺参数分别进行了研究，设置了一系列的实验参数,进行了详细的实验探索，分析了单因素条件下材料的去除量以及元件表面质量同关键工艺参数的内在联系，得出了相应影响关系曲线。从关系曲线表明:工艺参数对抛光斑的去除效率以及被加工元件表面质量存在着明显的影响规律，掌握这些影响关系就能用于分析和优化磁流变加工的结果，为高精度光学表面的加工提供可靠的保障，同时实验的结果也很好地验证了磁流变抛光材料去除理论的正确性。

Polishing parameters of magnetorheological finishing for high precision optical components

The magnetorheological finishing (MRF) is a newly developed technique in precision optical manufacturing which can produce optical components precisely with high efficiency and has been widely used. In order to fully grasp the influence law of polishing result by magnetic field intensity, immersion depth, polishing wheel speed and moisture content, we analyzed the removal mathematical model of magnetorheological finishing and then designed a series of experiments upon these process parameters by using PKC100-P1 equipment. Then we summarized the inner link between the final quality of optical component and the polishing parameters and finally drew a corresponding impact curve. The curve indicates that these process parameters have evident effects on the removal of material and component surface quality. Mastering the effects well, we can optimize the processing accuracy. Simultaneously the experimental results verified the correctness of the magnetorheological finishing material removal theory.