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Low‐temperature amorphous‐silicon backplane technology development for flexible displays in a manufacturing pilot‐line environment
Authors:Gregory B. Raupp  Shawn M. O'Rourke  Curt Moyer  Barry P. O'Brien  Scott K. Ageno  Douglas E. Loy  Edward J. Bawolek  David R. Allee  Sameer M. Venugopal  Jann Kaminski  Dirk Bottesch  Jeff Dailey  Ke Long  Michael Marrs  Nick R. Munizza  Hanna Haverinen  Nicholas Colaneri
Abstract:Abstract— A low‐temperature amorphous‐silicon (a‐Si:H) thin‐film‐transistor (TFT) backplane technology for high‐information‐content flexible displays has been developed. Backplanes were integrated with frontplane technologies to produce high‐performance active‐matrix reflective electrophoretic ink, reflective cholesteric liquid crystal and emissive OLED flexible‐display technology demonstrators (TDs). Backplanes up to 4 in. on the diagonal have been fabricated on a 6‐in. wafer‐scale pilot line. The critical steps in the evolution of backplane technology, from qualification of baseline low‐temperature (180°C) a‐Si:H process on the 6‐in. line with rigid substrates, to transferring the process to flexible plastic and flexible stainless‐steel substrates, to form factor scale‐up of the TFT arrays, and finally manufacturing scale‐up to a Gen 2 (370 × 470 mm) display‐scale pilot line, will be reviewed.
Keywords:Flexible displays  backplane electronics  thin‐film transistors  amorphous silicon  pilot‐line manufacturing
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