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The Properties of the Rectangular Arc Ion Plating with Magnetic Filtering Shutter |
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| Authors: | Shi Zhongbing Tong Honghui Liu XiaoboXiong Tao Li Yong Yan Fuxiu Zhao YanYang ZuoguiSouthwestern Institute of Physics Chengdu China |
| Affiliation: | Southwestern Institute of Physics, Chengdu 610041, China;Southwestern Institute of Physics, Chengdu 610041, China;Southwestern Institute of Physics, Chengdu 610041, China;Southwestern Institute of Physics, Chengdu 610041, China;Southwestern Institute of Physics, Chengdu 610041, China;Southwestern Institute of Physics, Chengdu 610041, China;Southwestern Institute of Physics, Chengdu 610041, China;Southwestern Institute of Physics, Chengdu 610041, China |
| Abstract: | A major obstacle to the broad application of cathodic arc plasma deposition is the presence of macroparticles. In this paper, the properties of the large rectangular arc ion plating with a magnetic filtering shutter system to filter macroparticles are studied. It is proposed that the macroparticles in the plasma beam are effectively removed with the magnetic filtering shutter system, and the quality of the deposited films is improved. |
| Keywords: | magnetic filtering shutter cathodic vacuum arc macroparticles removal plasma |
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