| 磁流变抛光材料去除的研究 |
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| 引用本文： | 张峰,潘守甫,张学军,王权陡,张忠玉.磁流变抛光材料去除的研究[J].光学技术,2001,27(6):522-523. |
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| 作者姓名： | 张峰 潘守甫 张学军 王权陡 张忠玉 |
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| 作者单位： | 1. 吉林大学 原子分子物理研究所,
2. 长春光学精密机械与物理研究所, |
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| 基金项目： | 国家自然科学基金资助项目 (6960 80 0 6) |
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| 摘 要： | 磁流变抛光是近十年来的一种新兴的先进光学制造技术 ,它利用磁流变抛光液在梯度磁场中发生流变而形成的具有粘塑行为的柔性“小磨头”进行抛光。被抛光光学元件的材料去除是在抛光区内实现的。首先简要阐述了磁流变抛光的抛光机理 ,然后利用标准磁流变抛光液进行抛光实验。研究了磁流变抛光中几种主要工艺参数对抛光区的大小和形状以及材料去除率的影响情况。最后给出了磁流变抛光材料去除的规律。
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| 关 键 词： | 磁流变抛光 抛光区 材料去除 |
| 文章编号： | 1002-1582(2001)06-0522-02 |
| 修稿时间： | 2001年5月19日 |
Research on material removal of magnetorheological finishing |
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| ZHANG Feng ,PAN Shou-fu ,ZHANG Xue-jun ,WANG Quan-dou ,ZHANG Zhong-yu.Research on material removal of magnetorheological finishing[J].Optical Technique,2001,27(6):522-523. |
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| Authors: | ZHANG Feng PAN Shou-fu ZHANG Xue-jun WANG Quan-dou ZHANG Zhong-yu |
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| Affiliation: | ZHANG Feng 1,PAN Shou-fu 1,ZHANG Xue-jun 2,WANG Quan-dou 2,ZHANG Zhong-yu 2 |
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| Abstract: | A new optical manufacturing technology called magnetorheological finishing(MRF) has developed over last decade. In MRF, the magnetic field stiffened magnetorheological polishing fluid (MPF)constitutes a small lap, which is used to polish optical element. Material removal of optical element is done in "polishing spot". Mechanism of MRF is described in this paper. In order to study the size and shape of "polishing spot" and the material removal rate of optical element, several MRF experiments have been done by using "standard" MPF. At last, the material removal rules of MRF have been given in the paper. |
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| Keywords: | magnetorheological finishing polishing spot material removal |
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