Synthesis and properties of novel polyamides containing sulfone‐ether linkages and xanthene cardo groups

In order to obtain polyamides with enhanced solubility and processability, as well as good mechanical and thermal properties, several novel polyamides containing sulfone‐ether linkages and xanthene cardo groups based on a new diamine monomer, 9,9‐bis[4‐(4‐aminophenoxy)phenyl]xanthene (BAPX), were investigated. The BAPX monomer was synthesized via a two‐step process consisting of an aromatic nucleophilic substitution reaction of readily available 4‐chloronitrobenzene with 9,9‐bis(4‐hydroxyphenyl)xanthene in the presence of potassium carbonate in N,N‐dimethylformamide, followed by catalytic reduction with hydrazine and Pd/C. Four novel aromatic polyamides containing sulfone‐ether linkages and xanthene cardo groups with inherent viscosities between 0.98 and 1.22 dL g^?1 were prepared by low‐temperature polycondensation of BAPX with 4,4′‐sulfonyldibenzoyl chloride, 4,4′‐[sulfonyl‐bis(4‐phenyleneoxy)]dibenzoyl chloride, 3,3′‐[sulfonyl‐bis(4‐phenyleneoxy)]dibenzoyl chloride and 4,4′‐[sulfonyl‐bis(2,6‐dimethyl‐1,4‐phenyleneoxy)]dibenzoyl chloride in N,N‐dimethylacetamide (DMAc) solution containing pyridine. All these new polyamides were amorphous and readily soluble in various polar solvents such as DMAc and N‐methylpyrrolidone. These polymers showed relatively high glass transition temperatures in the range 238–298 °C, almost no weight loss up to 450 °C in air or nitrogen atmosphere, decomposition temperatures at 10% weight loss ranging from 472 to 523 °C and 465 to 512 °C in nitrogen and air, respectively, and char yields at 800 °C in nitrogen higher than 50 wt%. Transparent, flexible and tough films of these polymers cast from DMAc solution exhibited tensile strengths ranging from 78 to 87 MPa, elongations at break from 9 to 13% and initial moduli from 1.7 to 2.2 GPa. Primary characterization of these novel polyamides shows that they might serve as new candidates for processable high‐performance polymeric materials. Copyright © 2010 Society of Chemical Industry