A concise process technology for 3-D suspended radio frequency micro-inductors on silicon substrate |
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| Authors: | Liang YC Wenjiang Zeng Pick Hong Ong Zhaoxia Gao Jun Cai Balasubramanian N |
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| Affiliation: | Dept. of Electr. Eng. & Comput. Sci., Univ. of California, Berkeley, CA, USA; |
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| Abstract: | In this letter, a concise process technology is proposed for the first time to enable the fabrication of good quality three-dimensional (3-D) suspended radio frequency (RF) micro-inductors on bulk silicon, without utilizing the lithography process on sidewall and trench-bottom patterning. Samples were fabricated to demonstrate the applicability of the proposed process technology. |
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