磁控溅射Cu薄膜的光电性能研究

利用磁控溅射技术,通过正交试验设计方法,在K9光学玻璃基底上制备了Cu薄膜,研究了溅射时间、基底温度和氩气流量对Cu薄膜光电性能的影响.研究表明:Cu薄膜的透射谱在紫外波段362 nm处有明显吸收峰,但在可见光波段吸收强度较弱,说明Cu膜在可见波段有较高的透光性;膜厚度增加则光学透射率降低.电阻率随膜厚的增大,大体上呈逐渐减小的趋势;1100 nm 为临界尺寸,Cu膜厚度<1100 nm时,电阻率值变化较快;Cu薄膜厚度>1100 nm时,电阻率变化缓慢至定值.当溅射时间为25 min、基底温度为300 ℃、氩气流量为6.9 sccm时所得样品在紫外-可见光区没有吸收,且导电性好.

Study on Opto-Electrical Properties of Cu Thin Films Deposited by Magnetron Sputtering

Cu Thin films were prepared by magnetron sputtering on K9 optical glass substrate based on orthogonal test, and the effects of sputtering time, substrate temperature, and argon flow rate on the optical properties and electrical properties of copper films were studied.The research show that the transmission spectrum of Cu thin films has obvious absorption peak at 362 nm, but the absorption is weak in visible light, indicating that the Cu thin film is transparent to visible light.The transmittance decreases as the film thickness increases.The resistivity decreases with the increase of the film thickness, and the resistivity value changes rapidly when the thickness of Cu thin film is less than 1100 nm.When the thickness of Cu thin film is more than 1100 nm, the resistivity changes slowly to the fixed value.When the sputtering time is 25 min, the substrate temperature is 300 ℃ and the argon flow rate is 6.9 sccm, the obtained sample has not absorption peak in the ultraviolet-visible region and has good conductivity.