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| BTA衍生物对铜缓蚀作用的光电化学研究 | |
| 引用本文： | 王冰,周国定,张万友,T Notoya. BTA衍生物对铜缓蚀作用的光电化学研究[J]. 太阳能学报, 2000, 21(1): 50-56 |
| 作者姓名： | 王冰 周国定 张万友 T Notoya |
| 作者单位： | 1. 上海电力学院电化学研究室,上海,200090 2. 东北电力学院应用化学系,吉林,132012 3. 日本北海道大学冶金工程系 |
| 基金项目： | 厦门大学固体表面物理化学国家重点实验室资助项目 |
| 摘 要： | 研究了铜电极在含ＢＴＡ及其系列ＣＢＴＭＥ，ＣＢＴＢＥ三种缓蚀剂的硼砂缓冲溶液中的光电化学行为。当溶液中含有一定量的ＢＴ，ＣＢＴＭＥ和ＣＢＴＢＥ时，电位在正向扫描过程中，电极光响应由ｐ型转变为ｎ型。ＢＴＡ的缓蚀作用优于ＣＢＴＭＥ和ＣＢＴＢＥ。一定比例的ＢＴＡ和ＣＢＴＭＥ复配后对铜的缓蚀作用有协同效应。可以用光电化学方法评价铜缓蚀剂的效果。交流阻抗法测得的结果与光电化学方法相符。 |
| 关 键 词： | 铜缓蚀剂 BTA 协同效应 光电化学 钢电极 |
| 修稿时间： | 1999-01-12 |
PHOTOELECTROCHEMISTRY STUDY OF INHIBITING ACTION OF BTA DERIVATIVES ON COPPER |
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| Wang Bing,Zhou Guoding,Zhang Wanyou,T Notoya. PHOTOELECTROCHEMISTRY STUDY OF INHIBITING ACTION OF BTA DERIVATIVES ON COPPER[J]. Acta Energiae Solaris Sinica, 2000, 21(1): 50-56 | |
| Authors: | Wang Bing Zhou Guoding Zhang Wanyou T Notoya |
| Affiliation: | Wang Bing Zhou Guoding;(Electrochemical Research Group,Shanghai Institute of Electric Power,Shanghai 200090);Zhang Wanyou;(Department of Applied Chemistry,The Northeast China Institute of Electric Power,Jilin132012);T Notoya;(Department of Metallurgical Engineering,Hokkaido University,Sapporo,Japan) |
| Abstract: | The photoelectrochemical behavior of copper electrode in borax buffer solutions (pH9.2)containing BTA,CBTME and CBTBE was studied by using photoelectrochemical technique.The photoresponse for Cu electrode in solutions containing a certain amount of inhibitors exhibits n type during anodic polarization.BTA shows the best for inhibiting action among the above inhibitors.A combination of BTA and CBTME exhibits a synergistic effect,and the optimum ratio with 5mg/dm 3 inhibitor is 2mg/dm 3BTA and 3mg/dm 3CBTME.The results from photoelectrochemical technique are in agreement with those from AC impedance technique. |
| Keywords: | inhibitor for copper corrosion BTA photoelectrochemical technique synergistic effect |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ | |
