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Deep 3D X-ray Lithography Based on High-Contrast Resist Layers |
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| Authors: | Naz’mov V. P. |
| Affiliation: | 1.Budker Institute of Nuclear Physics, Siberian Branch, Russian Academy of Sciences, 630090, Novosibirsk, Russia ; |
| Abstract: | Technical Physics Letters - In classical X-ray lithography, the mask and resist layer are arranged perpendicular to the incident X-ray beam. Being absorbed in the resist layer, the X-ray beam... |
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