铝质基体上Ti(C,N)/TiN多元多层膜工艺参数研究

首先在大范围内调节负偏压和基体温度两个参数，实现在铝质材料基体上沉积与基体结合良好的TiN膜，在此基础上通过调节N2、C2H2工作气氛流量比及Ti(C，N)、TiN膜层的层数，沉积了3类不同的膜，并对其力学与摩擦学性能进行了考察。结果表明：在(N2 C2H2)总流量一定的情况下，C2H2流量增大，则使Ti(C，N)膜层中含C量增多，膜层硬度提高，但韧性变差，表面变粗糙；在总厚基本不变的情况下，层数增多，单层变薄，使膜材晶粒细化，硬度提高，韧性变好。在3类膜中，1#膜C2H2流量适当且膜层数最多(6层)，其摩擦学性能表现最好，临界荷载为76N，显徼硬度为1911HV0.1，与基体相比，耐磨性提高了10倍多。

Investigations of Processing Parameters for Ti(C,N)/TiN Multi-element-layer Film Deposited on Aluminium Alloy

Negative bias and substrate temperature were adjusted to deposit TiN film with best adhesion. Through adjusting gas flow rate of N2 and C2H2,, three kinds of Ti(C,N)/TiN multi-element-layer thin films were deposited on aluminium alloy substrate. Their mechanical and tribological properties were investigated. The results indicated that increase of C2H2 flow led to increasing content of C in Ti(C,N) layer and hardness of the film. But, at the same time, it resulted in decrease of toughness and increase of roughness of the film when the whole flow of C2H2 and N2 was constant. When the whole thickness was almost unchanged , and layer number was increased, the grains of film became fine ,hardness increased and toughness improved. When the C2H2 flow of 1# film was proper and its layer number was maximum, its toughness and wear resistance were best, its average critical load was 76N, its microhardness reached 1911HV0.1 and its wear resistance increased by 11 times compared with that of the substrate.