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正交电子束和X射线照射野衔接的剂量学分析
引用本文:傅玉川,肖江洪,李乾坤,蒋晓芹,李平.正交电子束和X射线照射野衔接的剂量学分析[J].生物医学工程学杂志,2008,25(3):673-677.
作者姓名:傅玉川  肖江洪  李乾坤  蒋晓芹  李平
作者单位:1. 四川大学,华西医院,肿瘤放疗科,成都,610041
2. 四川大学,原子核科学技术研究所,成都,610064
摘    要:正交电子野和光子野衔接区域,一定会有剂量热点和冷点出现,剂量分布不均匀程度与治疗机的物理参数直接相关.本文通过测量了Elekta Precise 治疗机和Elekta Synergy 治疗机X射线和电子线的部分剂量学参数,对正交电子束和X(γ)射线照射野的衔接区域内的剂量分布的不均匀程度进行了定量分析,提出用扩展光子野半影的方法来降低剂量分布的不均匀程度,比较了不同治疗机条件下衔接区域内的剂量分布.结果表明,无论是在未扩展光子野半影的情况下,还是在扩展了光子野半影的情况下,与使用Elekta Precise 治疗机相比,使用光子射野半影较小的Elekta Synergy 治疗机,电子野与光子野衔接区域内的剂量不均匀程度更强.

关 键 词:电子野和光子野的衔接  半影扩展  剂量分析  正交  电子束  射线  照射野衔接  剂量学参数  定量分析  Fields  Matching  Region  使用  情况  结果  条件  比较  方法  扩展  电子线  Synergy  Precise  测量

Dosimetric Analysis on the Region of Perpendicular Electron-Photon Matching Fields
Fu Yuchuan,Xiao Jianghong,Li Qiankun,Jiang Xiaoqin,Li Ping.Dosimetric Analysis on the Region of Perpendicular Electron-Photon Matching Fields[J].Journal of Biomedical Engineering,2008,25(3):673-677.
Authors:Fu Yuchuan  Xiao Jianghong  Li Qiankun  Jiang Xiaoqin  Li Ping
Affiliation:Department of Radiation Oncology, West China Hospital, Sichuan Uniwversity, Chengdu 610041, China.
Abstract:Hot spots and cold spots always appear in the matched region of electron-photon fields. The degree of this kind of dose heterogeneity depends on the physical characteristic of a treatment unit and the energy of electrons. In this paper, a set of dosimetric parameters have been measured on electron rays and x rays for the Elekta Precise treatment unit and the Elekta Synergy treatment unit, respectively. The hot spots and cold spots in the region of perpendicular electron-photon matching fields have been analysed quantitatively. The method to extend penumbra for photon beam profiles was proposed for improving the dose uniformity in the matched regions. And the dose profiles in the matched regions for different treatment units were compared. The results showed that there were stronger hot spots and cold spots for treatment unit with smaller penumbra for photon beams either under the condition of unmodified photon beam profile or the condition of modified photon beam profile.
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