| ZnO薄膜制备工艺的研究进展 |
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| 引用本文： | 马越雷,赵汝明.ZnO薄膜制备工艺的研究进展[J].电子元件与材料,2008,27(8). |
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| 作者姓名： | 马越雷 赵汝明 |
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| 作者单位： | 大连化工研究设计院,辽宁,大连,116023 |
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| 摘 要： | 从ZnO晶体结构入手,介绍了ZnO薄膜制备工艺的研究现状与进展,包括基片的选择,缓冲层的影响,薄膜极性的控制与制备技术。并指出基片的选择、薄膜的成核生长过程与界面问题仍是今后研究的重点。
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| 关 键 词： | 电子技术 ZnO薄膜 综述 制备工艺 表面形貌 微观结构 |
Research progress of preparation process for ZnO thin film |
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| MA Yue-lei,ZHAO Ru-ming.Research progress of preparation process for ZnO thin film[J].Electronic Components & Materials,2008,27(8). |
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| Authors: | MA Yue-lei ZHAO Ru-ming |
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| Affiliation: | MA Yue-lei,ZHAO Ru-ming (Dalian Research &Design Institute of Chemical Industry,Dalian 116023,Liaoning Province,China) |
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| Abstract: | ZnO crystal structure was briefly introduced. The research current status and progress of preparation process for ZnO thin film were introduced including selection of substrate, influence of buffer layer, polarity control of thin film and preparation technology. And the selection of substrate, nucleating growth process and interface issues of ZnO thin film are still focus in the future research. |
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| Keywords: | electron technology ZnO thin film review preparation process surface morphology microstructure |
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