Influence of ion bombardment on the properties and microstructure of unbalanced magnetron deposited niobium coatings |
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Authors: | T Savisalo D B Lewis P Eh Hovsepian W -D Münz |
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Affiliation: | Materials Research Institute, Sheffield Hallam University, Howard St., Sheffield S1 1WB, UK |
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Abstract: | The effect of the ion bombardment to unbalanced magnetron deposited, approximately 1.5 and 4.5 μm thick, Nb coatings have been investigated as the bias voltage was varied from UB=?75 to ?150 V. Increasing bias voltage increased the hardness of the coating from 4.5 to 8.0 GPa. This was associated with residual stress and Ar incorporation into the Nb lattice. Strong {110} texture developed in the samples deposited at low bias voltages, while beyond UB=?100 V a {111} texture became dominant. However, strong {111} texture was observed only with the thicker 3Nb coatings. Secondary electron microscopy investigation of the coating topography showed fewer defects in the thicker coatings. All coatings exhibited good corrosion resistance, with the thicker coatings clearly outperforming the thinner ones. Excessive bias voltages (UB=?150 V) was found to lead to poor adhesion and loss of corrosion resistance. |
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Keywords: | Niobium coatings Bias voltage Ion bombardment |
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