The kinetics of photodissolution of Ag in amorphous As2S3 films |
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Authors: | D. Goldschmidt P.S. Rudman |
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Affiliation: | Department of Physics, Technion - Israel Institute of Technology, Haifa, Israel |
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Abstract: | A new technique, measurement of the electrical resistance change of the Ag layer, is developed to study the kinetics of photodissolution of Ag in amorphous As2S3. It is shown that the photodissolution rate is proportional to the light intensity absorbed in the As2S3 at the As2S3Ag interface, but photoelectrons ejected from the Ag into the As2S3 also contribute. The process is shown to be two-stage. Firstly a critical “radiation damage” dose must be accumulated in the As2S3. Secondly, the Ag atom is photon-assisted across the As2S3Ag interface activation barrier. |
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