高功率脉冲和脉冲直流磁控共溅射CrAlN薄膜的研究

目的通过掺杂适量Al元素来固溶强化Cr N薄膜,从而提高薄膜的抗氧化性能和热稳定性。方法采用高功率脉冲磁控溅射和脉冲直流磁控溅射复合镀膜技术制备了Cr Al N薄膜,利用XRD、纳米压痕仪、应力仪、摩擦磨损试验机系统地研究了不同基体偏压对CrAlN涂层结构和力学性能的影响。结果所有CrAlN涂层均以fcc-(Cr,Al)N相为主,且随着基体偏压的增加,沿(111)晶面生长的衍射峰逐渐减弱,并向小角度偏移;薄膜压应力显著增加,最大值为-2.68GPa;薄膜硬度先上升后下降,在基体偏压为-30V时,硬度达到最大值22.3 GPa;H/E值和H~3/E~(*2)值随着基体偏压的增加,近似线性增大,当偏压为-120 V时,均达最大值0.11、0.21 GPa,同时摩擦系数和磨损率逐渐减小。结论当基体偏压为-120 V时,CrAlN薄膜具有最佳的耐磨性能,H/E和H~3/E~(*2)在一定程度上可评价涂层的耐磨性。

CrAlN Coatings Prepared by HiPIMS/Pulsed-DC Co-sputtering

The work aims to strengthen CrN film through solid solution by doping appropriate amount of Al, so as to improve the oxidation resistance and thermal stability of the film. High power impulse magnetron sputtering and pulsed direct current mag-netron sputtering were adopted to deposit Cr-Al-N films and the influence of different substrate biases on the structure and me-chanical properties of the coating was studied by XRD, indentation tester, film stress tester and friction tests. All CrAlN coatings exhibited a face-centered cubic (Cr,Al)N solid solution phase. As the substrate bias increased, the diffraction peaks growing along the (111) plane gradually weakened and shifted toward a small angle; the compressive stress of the film increased remarkably; the hardness of the film rose first and then decreased, and the hardness reached a maximum value of 22.3 GPa when the substrate bias was -30 V. The H/E value and the H3/E*2 value increased approximately linearly with the increase of the substrate bias voltage, and the maximum values were 0.11 and 0.21 at -120 V, respectively, and the friction coefficient and wear rate were gradually reduced. When the substrate bias is -120 V, the CrAlN film has the best wear resistance; H/E and H3/E*2 can be used to evaluate the wear resistance of the coating.