| 三价铬硫酸盐电镀铬的发展现状 |
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| 引用本文： | 李永彦,李宁,屠振密,赵坤.三价铬硫酸盐电镀铬的发展现状[J].电镀与精饰,2009,31(1). |
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| 作者姓名： | 李永彦 李宁 屠振密 赵坤 |
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| 作者单位： | 哈尔滨工业大学(威海)应用化学系,山东,威海,264209 |
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| 摘 要： | 综述了三价铬镀液电镀铬特别是三价铬硫酸盐镀液电镀铬的发展现状,对三价铬硫酸盐和氯化物镀液镀铬进行了比较.对三价铬硫酸盐镀液电镀铬的特点、工艺、镀层特性进行了评述,并列出了近几年来发展的硫酸盐电镀铬工艺,还对存在的问题和解决途径进行了探讨.
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| 关 键 词： | 三价铬电镀液 硫酸盐体系 镀液稳定性 电镀铬 |
Development Status of Chromium Plating from Trivalent Chromium Sulfate Solution |
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| LI Yong-yan,LI Ning,TU Zhen-mi,ZHAO Kun.Development Status of Chromium Plating from Trivalent Chromium Sulfate Solution[J].Plating & Finishing,2009,31(1). |
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| Authors: | LI Yong-yan LI Ning TU Zhen-mi ZHAO Kun |
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| Affiliation: | Department of Applied Chemistry;Harbin Institute of Technology;Weihai 264209;China |
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| Abstract: | The sulfate solution for trivalent chromium plating is compared with the chloride plating solution.The priority of plating process based on sulfate solution and the features of the obtained coatings are reviewed. Several plating processes based on sulfate solution are introduced in details, and the existing problems and the countermeasures are also discussed. |
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| Keywords: | trivalent chromium electroplating solution sulfate plating system bath stability chromium plating |
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