Table top nanopatterning with extreme ultraviolet laser illumination |
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| Affiliation: | 1. NSF Engineering Research Center for Extreme Ultraviolet Science & Technology, Colorado State University, Fort Collins, CO 80523, United States;2. Department of Electrical and Computer Engineering, Colorado State University, Fort Collins, CO 80523, USA;3. Departamento de Fisica, Facultad de Ciencias Exactas y Naturales, Ciudad Universitaria, Buenos Aires C1428EHA, Argentina;4. Center of X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, United States;5. University of California at Berkeley, Berkeley, CA 94720, United States;1. Semiconductor Devices Division, Berlin University of Technology, Berlin, Einsteinufer 19, 10587 Berlin, Germany;2. French Space Agency (CNES), Toulouse, France;3. Hamamatsu Photonics Deutschland, Herrsching, Germany;1. School of Materials Science and Engineering, Sichuan University, PR China;2. National Engineering Research Center for Biomaterials, Sichuan University, Chengdu 610064, Sichuan, PR China;1. Institute of NanoEngineering and MicroSystems, National Tsing Hua University, No. 101, Section 2, Kuang Fu Road, Hsinchu 30013, Taiwan;2. Department of Power Mechanical Engineering, National Tsing Hua University, No. 101, Section 2, Kuang Fu Road, Hsinchu 30013, Taiwan |
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| Abstract: | Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were printed in a few seconds in poly-methyl methacrylate resist. These proof-of-principle experiments demonstrate practical table-top nanopatterning tools based on extreme ultraviolet lasers for nanotechnology applications. |
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