Terahertz absorption and emission upon the photoionization of acceptors in uniaxially stressed silicon

Experimental data on the spontaneous emission and absorption modulation in boron-doped silicon under CO₂ laser excitation depending on the uniaxial stress applied along the 001] and 011] crystallographic directions are presented. Room-temperature radiation is used as the probe radiation. Low stress (less than 0.5 kbar) is shown to reduce losses in the terahertz region by 20%. The main contribution to absorption modulation at zero and low stress is made by A⁺ centers. Intersubband free hole transitions additionally contribute to terahertz absorption at higher stress. These contributions can be minimized by compensation.