| 摆式聚焦-偏转复合电子光学系统的原理 |
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| 引用本文： | 乔谊正.摆式聚焦-偏转复合电子光学系统的原理[J].山东大学学报(工学版),1986(6). |
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| 作者姓名： | 乔谊正 |
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| 作者单位： | 山东工业大学电机工程系 |
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| 摘 要： | 提出一种新的聚焦偏转复合系统——摆式聚焦偏转复合系统(Pendulum combined Focusing and Deflection System)。PFDS主轨迹为直线,透镜场将电子束聚焦到象平面上,同时PFDS偏转器提供了必要的偏转场,使光轴同步地随入射电子斜率摆动。PFDS大大减小了各种离轴象差,而它的一级横向色差和三级畸变理论上为零。导出了实现PFDS的充要条件,以及在纯磁条件下三级几何象差系数和一级色差系数的明显表达式。
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| 关 键 词： | 电子光学 电子束 电子束加工 |
The Principle of Pendulum Combined Focusing and Deflection System |
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| Qiao Yizheng.The Principle of Pendulum Combined Focusing and Deflection System[J].Journal of Shandong University of Technology,1986(6). |
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| Authors: | Qiao Yizheng |
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| Affiliation: | Dept. of Electrical Eng. |
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| Abstract: | A new Electron Beam Lithography System (EBLS) called the Pendulum combined Focusing and Deflection System (PFDS) is presented in this paper It offers linear principal trajectory. Focusing field focuses the electron beam at image plane, while PFDS deflector produces the necessary deflection field to swing the optic axis sychronously with the entrance slope of the principal trajectory PFDS reduces off-axis aberrations greatly, and its first-order transverse chromatic aberration and third order distortion are nil in theory. The necessary and sufficient condition to achieve the PFDS principal trajectory is derived by author All third-order geometrical aberration coefficients and first-order chromatic aberration coefficients for the PFDS using magnetic lens and magnetic deflectors are given in obvious formulas |
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| Keywords: | Electron-optics Electron beam Electron beam machining |
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