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Characterization of sputtered NiO films using XRD and AFM |
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| Authors: | I. Hotovy J. Huran L. Spiess |
| Affiliation: | (1) Department of Microelectronics, Slovak University of Technology, Ilkovicova 3, 812 19 Bratislava, Slovakia;(2) Institute of Electrical Engineering, Slovak Academy of Sciences, Dubravska cesta 9, 842 39 Bratislava, Slovakia;(3) Institut fuer Werkstofftechnik, Technische Universitaet Ilmenau, PF 100565, D-98684 Ilmenau, Germany |
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| 本文献已被 SpringerLink 等数据库收录！ | |
