连续型平面衍射聚光透镜掩模的制作

针对目前二元光学元件掩模制作工艺过程的诸多不足，对连续型平面衍射聚光透镜掩模的激光直写制作工艺进行了研究。基于基尔霍夫标量衍射理论，采用光线追迹法设计了连续型平面衍射聚光透镜掩模。采用激光直写技术，利用CLWS 300M／C极坐标激光直写设备、S1830光刻胶和MICROPOSIT 351显影液，进行了刻写实验。实验表明，激光能量、预烘烤温度、显影液浓度以及预曝光对掩模微结构的制作均有影响。最后制作了掩模。与二元光学元件掩模的制作工艺相比，该技术具有工艺简单、制作周期短且易于操作的优点。

Fabrication of continuous relief mask for diffractive plane focus lens

The fabrication technology of continuous relief mask for diffractive plane focus lens is studied in the paper.According to Kirchhoff's scalar diffraction theory,with the ray tracing method,a continuous relief mask for diffractive focus lens has been designed.Using the technology,some experiments on the writing of the mask were carried out with the help of CLWS-300M/C.The results show that the laser energy,prebake temperature,developer concentration and pre-exposure will affect the microstructure of the mask.The mask was fabricated with such technology after a lot of efforts.Compared with the technology for binary optical mask,the technology has the following strong points: process simplification,short period of fabrication and easy operation.