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Effect of oxygen exposure on the magnetic properties of ultrathin Co/Ge(1 1 1) films
Authors:JS Tsay  HW Chang  YL Chiou  KT Huang  WY Chan  YD Yao
Affiliation:1. Department of Physics, National Chung Cheng University, Chiayi 621, Taiwan, ROC;2. Department of Physics, Tunghai University, Taichung 407, Taiwan, ROC;3. Institute of Physics, Academia Sinica, Nankang, Taipei 11529, Taiwan, ROC
Abstract:Influences of oxygen exposure on the magnetic properties of Co/Ge(1 1 1) ultrathin films have been investigated by surface magneto-optic Kerr effect technique. As the oxygen exposure increases on Co/Ge(1 1 1) films, their magnetic properties could be modified. As an example for 15 ML Co/Ge(1 1 1) films, the coercivity increases from 730 to 920 Oe and the remanence Kerr intensity is reduced for 500 Langmuir (L) of oxygen exposure. Corresponding compositions analyzed by Auger electron spectroscopy measurement shows that the amount of oxygen on the surface layers increases with increasing the oxygen exposure time. Oxygen distributes on the topmost layers of the film. The adsorbed oxygen influences the electronic density of states of Co and results in the changes of the magnetic properties. Besides, the appearance of O/Co/Ge interface could modify the stress anisotropy, and as a result the coercivity of ultrathin Co/Ge(1 1 1) film is enhanced.
Keywords:Surface magneto-optic Kerr effect  Cobalt  Germanium  Ultrathin films  Oxygen exposure
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