纳米多层膜的电性能及表面形貌

用热蒸发沉积和自然氧化法制备纳米量级的Al／Al2O3及Cr／Cr2O3薄膜和多层膜．本文采用三点法测定了常温、低温下的U—I特性，发现常温、低温下纳米量级的Al／Al2O3及Cr／Cr2O3薄膜具有类似负阻的特性。SEM检测表明，薄膜表面均匀，薄膜的厚度和称重法所得的厚度基本相符．AFM和STM观察表明薄膜表面存在着岛状结构，表面粗糙度在纳米尺度范围内。

Electric properties and surface morphology of multilayer nanofilms

Al/Al2O3 and Cr/Cr2O3 nanofilms and multilayer nanofilms were prepared on glass substrates by way of thermal evaporative deposition followed by natural oxidation. The U-I properties of the samples at room temperature and low temperature (77K) were tested by three-point measurement. It was found that both the Al/Al2O3 and Cr/Cr2O3 multilayers nanofilms have a negative-resistance-like feature. STM resuets showed that the film surfaces are homogeneous and their thicknesses are basically in conformity to those obtained by weighing method. AFM and STM images showed that there are island structure found on film surfaces and the roughness is limited to nanometer size magnitude.