Nitrogen incorporated diamond-like carbon films by microwave surface wave plasma CVD |
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| Authors: | X.M. Tian S. Adhikari S. Adhikary H. Uchida M. Umeno T. Soga T. Jimbo |
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| Affiliation: | aDepartment of Electronics and Information Engineering, Chubu University, 1200 Matsumoto-cho, Kasugai 487-8501, Japan;bDepartment of Electrical and Electronic Engineering, Chubu University, 1200 Matsumoto-cho, Kasugai 487-8501, Japan;cDepartment of Environmental Technology and Urban Planning, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555, Japan |
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| Abstract: | Nitrogen incorporated diamond like carbon films have been deposited by microwave surface wave plasma chemical vapor deposition (MW-SWP-CVD), using methane (CH4) as the source of carbon and with different nitrogen flow rates (N2 / CH4 flow ratios between 0 and 3). The influence of the nitrogen incorporation on the optical, structural properties and surface morphology of the carbon films were investigated using different spectroscopic techniques. The nitrogen has been incorporated into DLC:N films which was confirmed by the X-ray photoelectron spectroscopy (XPS) measurement. Moreover, the nitrogen incorporation was accompanied by a variation in the optical gap, which was attributed to the removal or creation of band tail states. |
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| Keywords: | Nitrogen incorporation Optical gap DLC:N films MW-SWP-CVD |
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