Crystallographic properties of four-fold grain K3Li2Nb5O15 thin films |
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Authors: | Sung-Kun Park |
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Affiliation: | Hynix Semiconductor Inc., System IC, SoC Device 2 Team, Hyangjeong-dong, Cheongju-si 361-725, South Korea |
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Abstract: | The structural properties of a potassium lithium niobate (KLN; K3Li2Nb5O15) thin film deposited by rf-magnetron sputtering on a Pt/Ti/SiO2/Si(100) substrate were investigated. The crystalline structures of the Pt under layer and KLN thin films were examined using θ-2θ, θ-rocking, and mesh scan X-ray diffraction (XRD). The XRD results revealed that the Pt under layer was a strong (111) direction orientated poly crystal. Unlike the Pt under layer film, the KLN(001) peak was found to consist of two separate peaks, one with a broad full width half maximum (FWHM) and the other with a narrow FWHM, indicating that the KLN film had a single crystalline structure. The surface and cross-section morphology were investigated using a scanning electron microscope (SEM). Accordingly, from the results of the SEM and XRD experiments, it was concluded that the KLN film was composed of small single crystals, which had a four-fold symmetry morphology with a c-axis normal to the substrate. |
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Keywords: | Deposition process Growth mechanism SEM Sputtering X-ray diffraction |
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