| 高功率脉冲磁控放电等离子体注入与沉积CrN薄膜研究 |
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| 引用本文： | 吴忠振,田修波,王泽明,巩春志,杨士勤.高功率脉冲磁控放电等离子体注入与沉积CrN薄膜研究[J].真空科学与技术学报,2011,31(4):459-464. |
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| 作者姓名： | 吴忠振 田修波 王泽明 巩春志 杨士勤 |
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| 作者单位： | 哈尔滨工业大学现代焊接与连接国家重点实验实 哈尔滨150001 |
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| 基金项目： | 国家自然科学基金资助项目(10775036和50373007); 新世纪优秀人才计划资助项目 |
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| 摘 要： | 采用高功率脉冲磁控放电等离子体离子注入与沉积的方法在不锈钢基体上制备了高膜基结合力的CrN硬质薄膜,并研究了不同的Ar/N流量比对薄膜形貌、结构及性能的影响.采用扫描电子显微镜、X射线衍射对其表面形貌和结构进行分析,发现制备的薄膜表面光滑、致密,相结构单一,主要是CrN(200)相.对薄膜的结合力、硬度、弹性模量、耐磨...
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| 关 键 词： | 高功率脉冲磁控放电 等离子体离子注入与沉积 氮化铬 微观结构 表面性能 |
Growth of CrN Films by Plasma Ion Implantation & Deposition Based on High Power Pulsed Magnetron Discharge |
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| Wu Zhongzhen,Tian Xiubo,Wang Zeming,Gong Chunzhi,Yang Shiqin.Growth of CrN Films by Plasma Ion Implantation & Deposition Based on High Power Pulsed Magnetron Discharge[J].JOurnal of Vacuum Science and Technology,2011,31(4):459-464. |
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| Authors: | Wu Zhongzhen Tian Xiubo Wang Zeming Gong Chunzhi Yang Shiqin |
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| Affiliation: | Wu Zhongzhen,Tian Xiubo,Wang Zeming,Gong Chunzhi,Yang Shiqin(State Key Laboratory of Advanced Welding and Joining,Harbin Institute of Technology,Harbin 150001,China) |
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| Abstract: | The CrN films were grown by high power pulsed magnetron discharge plasma ion implantation deposition on stainless steel substrates.The impacts of the deposition conditions,especially the gas flow-rate ratio of argon and nitrogen,on the CrN films were studied.Its microstructures and mechanical properties were characterized with X-ray diffraction,scanning electron microscopy and conventional mechanical probes.The results show that the smooth,compact CrN films with strong interface adhesion significantly impro... |
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| Keywords: | High power pulsed magnetron discharge Plasma ion implantation and deposition CrN Micro-structure Surface properties |
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