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| Technique for Monolithic Fabrication of Microlens Arrays Integrated with Infrared CCD | |
| 作者姓名： | 陈四海 王宏臣 何苗 易新建 |
| 作者单位： | CHEN Sihai(陈四海):Dept. of Optoelectronic Engineering, Huazhong University of Science and Technology, Wuhan 430074, China YI Xinjian(易新建):State Key Laboratory for Image Information & Intelligence Control,Huazhong University of Science and Technology, Wuhan 430074, China WANG Hongchen(王宏臣):The National Key Laboratory for Laser Technology, Huazhong University of Science and Technology, Wuhan 430074, China HE Miao(何 苗):The National Key Laboratory for Laser Technology, Huazhong University of Science and Technology, Wuhan 430074, China |
| 基金项目： | SupportedbytheNationalNaturalScienceFoundation ofChina (6 0 0 86 0 0 3) |
| 摘 要： | 1 Ｉｎｔｒｏｄｕｃｔｉｏｎ Ｔｈｅｉｎｆｒａｒｅｄｃｈａｒｇｅｃｏｕｐｌｅｄｄｅｖｉｃｅ(ＩＲＣＣＤ )ｓｅｎｓｉｔｉｖｅｆｒｏｍ 3ｔｏ 5μｍｈａｓｎｕｍｅｒｏｕｓａｐｐｌｉｃａｔｉｏｎｓｉｎｂｏｔｈｍｉｌｉｔａｒｙａｎｄｃｉｖｉｌｉｎｄｕｓｔｒｉｅｓ1] .Ｔｏ ｇｅｔｌａｒｇｅａｒｒａｙＩＲＣＣＤ ,ｒｅｃｅｎｔｔｒｅｎｄｓｉｎＩＲＣＣＤｔｅｃｈｎｏｌｏｇｙａｒｅｔｏｒｅｄｕｃｅｂｏｔｈ ｐｉｘｅｌｓｉｚｅａｎｄｔｈｅａｃｔｉｖｅａｒｅａ .Ｗｈｅｒｅａｓｔｈｅｆｏｒｍｅｒｉｎｃｒｅａｓｅｓａｒｒａ… |
| 收稿时间： | 2001/6/13 |
Technique for Monolithic Fabrication of Microlens Arrays Integrated with Infrared CCD |
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| Abstract: | Based on scalar diffraction theory, 8-phase-level 256×256 elements diffractive microlens array with element dimension of 50×33 μm2 have been fabricated on the back-side of PtSi(3～5 μm) infrared CCD. The measurement results indicated that the ratio of the signal-to-noise of the infrared CCD with microlens was increased by a factor of 2.8. |
| Keywords: | monolithic integration infrared CCD diffractive microlens arrays ion beam milling |
