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High-reflectivity HfO2/SiO2 ultraviolet mirrors |
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| Authors: | Torchio Philippe Gatto Alexandre Alvisi Marco Albrand Gérard Kaiser Norbert Amra Claude |
| Affiliation: | Institut Fresnel, Unité Mixte de Recherche, Centre National de la Recherche Scientifique, Ecole National Supérieure de Physique de Marseille, Domaine Universitaire de St Jér?me, France. philippe.torchio@fresnel.fr |
| Abstract: | High-reflectivity dense multilayer coatings were produced for the ultraviolet spectral region. Thin-film single layers and UV mirrors were deposited by ion plating and plasma ion-assisted deposition high-energetic technologies. Optical characterizations of HfO2 and SiO2 single layers are made. The optical constants obtained for these two materials are presented. HfO2 and SiO2 mirrors with a reflectance of approximately 99% near 250 nm are reported. |
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