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To-and-fro motion of W5Si3 on a beta-Si3N4 substrate at elevated temperatures. |
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| Authors: | S Arai K Suzuki H Saka |
| Affiliation: | Center for Integrated Research in Science and Technology, Nagoya University, 464-8603, Japan. |
| Abstract: | Behavior of fine crystalline particles of W5Si3 on a beta-Si3N4 substrate at high temperatures was observed by an in situ heating experiment in a transmission electron microscope. Some of the fine particles of W5Si3 moved in a to-and-fro manner. |
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