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钴掺杂对氧化镍薄膜电致变色性能的影响
引用本文:王景,苏革,曹立新,柳伟,董征,赵莉丽,宋美芹. 钴掺杂对氧化镍薄膜电致变色性能的影响[J]. 材料研究学报, 2011, 0(2): 179-182
作者姓名:王景  苏革  曹立新  柳伟  董征  赵莉丽  宋美芹
作者单位:中国海洋大学材料科学与工程研究院;
基金项目:山东省自然科学基金ZR2010EM027~~
摘    要:采用恒电位法在FTO玻璃上沉积Co与Ni摩尔比为0.16:1的薄膜,用X射线衍射仪、扫描电镜和能谱仪分析了膜的成分、结构和形貌,用紫外-可见分光光度计表征了膜的透光性能,用循环伏安法表征了膜的电化学稳定性和可逆性,用双电位阶跃法表征了膜的开关响应时间,研究了钴掺杂对氧化镍薄膜电致变色性能的影响。结果表明,钴掺杂使NiO薄膜颗粒更加细小和均匀,提高了薄膜在可见光波段着色态与消色态之间的透光率差值,降低了电致变色反应的工作电压,有利于薄膜在电致变色过程的可逆性,缩短了着色响应时间。

关 键 词:无机非金属材料  电致变色  钴掺杂氧化镍薄膜  可逆性

Effect of Co on the Electrochromic Properties of NiO Film
WANG Jing SU Ge CAO Lixin LIU Wei DONG Zheng ZHAO Lili SONG Meiqin. Effect of Co on the Electrochromic Properties of NiO Film[J]. Chinese Journal of Materials Research, 2011, 0(2): 179-182
Authors:WANG Jing SU Ge CAO Lixin LIU Wei DONG Zheng ZHAO Lili SONG Meiqin
Affiliation:WANG Jing SU Ge~(**) CAO Lixin LIU Wei DONG Zheng ZHAO Lili SONG Meiqin (Institute.of Materials Science and Engineering,Ocean University of China,Qingdao 266100)
Abstract:The film of Co/Ni molar ratio of 0.16:1 was electrode posited on FTO glass by potentiostatic technique.XRD,SEM and EDS were employed to analyze the morphology composition,structure of the film;Uhraviolet-visible transmission spectroscopy was applied to measure transmittance of the films. Cyclic voltammetry was used to characterize the electrochemical stability and reversibility of the film.And switch response time was measured by double potential step technique.The Effect of Co on the electrochromic propert...
Keywords:inorganic non-metallic materials  electrochromic  Co-doped NiO film  reversibility  
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