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双曝光全息干涉测量
引用本文:赵安宁,刘洁.双曝光全息干涉测量[J].中国计量学院学报,1992(1).
作者姓名:赵安宁  刘洁
作者单位:中国计量学院成教处,云南省标准计量局
摘    要:本文论述了双曝光全息干涉测量技术的基本理论和实际应用方法。并进而推论了条纹形状和物体微小位移之间的定量关系。最后给出了实验装置和实验结果。

关 键 词:双曝光  全息  测量

On the Double-Exposure Holographic Interference Measurement
Zhao Anning,Liu Jie Division of Adult Education Yunnan Province Bureau of Sdandardization and Metrology.On the Double-Exposure Holographic Interference Measurement[J].Journal of China Jiliang University,1992(1).
Authors:Zhao Anning  Liu Jie Division of Adult Education Yunnan Province Bureau of Sdandardization and Metrology
Affiliation:Zhao Anning;Liu Jie Division of Adult Education Yunnan Province Bureau of Sdandardization and Metrology
Abstract:The fundamental theory of the double exposure holographic interference measuring technique is presented, and the practical method of its application in the micro-measurement is studied. The relationship between the strip patten and the displacement of the object is analyzed quantitatively. And finally, the experiment device and measuring results are given.
Keywords:Double--Exposure  Holography  Micro--Measurement
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