| 大角度离子注入机中的颗粒污染 |
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| 引用本文： | 王迪平,孙勇.大角度离子注入机中的颗粒污染[J].电子工业专用设备,2010,39(7):5-8,51. |
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| 作者姓名： | 王迪平 孙勇 |
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| 作者单位： | 中国电子科技集团公司第四十八研究所,湖南,长沙,410111 |
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| 摘 要： | 针对大角度离子注入机中的颗粒污染进行了分析和探讨,着重描叙了颗粒的产生,对注入掺杂的影响;介绍了颗粒的测量和监控;重点列出了如何从设计上减少颗粒污染的产生途径以及生产设备怎样预防颗粒污染。
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| 关 键 词： | 大角度离子注入机 颗粒污染 产生 注入掺杂 预防 |
Particulate Contamination Of The Large Tilt Ion Implanter |
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| WANG Diding,SUN Yong.Particulate Contamination Of The Large Tilt Ion Implanter[J].Equipment for Electronic Products Marufacturing,2010,39(7):5-8,51. |
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| Authors: | WANG Diding SUN Yong |
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| Affiliation: | WANG Diding,SUN Yong(The 48th research institute,CETC,Changsha 410111,China) |
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| Abstract: | This paper analyses and inquires into the particulate contamination of the large tilt ion implanter,gives an account of the particulate's production for important and how to influence the dose doping;introduces how to measure and monitor the particulate;In particular,lists how to decrease the route for produce to the particulate contamination from design and the equipment for production how to prevent the particulate contamination. |
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| Keywords: | the large tilt ion implanter particulate contamination production dose doping prevent |
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