| 808 nm大功率半导体激光器阵列的优化设计 |
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| 引用本文： | 杨晔,刘云,秦莉,王烨,梁雪梅,李再金,胡黎明,史晶晶,王超,王立军.808 nm大功率半导体激光器阵列的优化设计[J].强激光与粒子束,2011,23(1). |
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| 作者姓名： | 杨晔 刘云 秦莉 王烨 梁雪梅 李再金 胡黎明 史晶晶 王超 王立军 |
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| 作者单位： | １． 中国科学院 长春光学精密机械与物理研究所, 激发态物理重点实验室， 长春 130033；2． 中国科学院 研究生院， 北京 100039 |
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| 基金项目： | 吉林省科技厅重大项目，吉林省科技厅科技攻关项目 |
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| 摘 要： | 采用激射波长为808 nm的GaAs/AlGaAs梯度折射率波导分别限制单量子阱结构外延片，制备了沟道深度不同的半导体激光器阵列，并对载流子分布进行理论分析和模拟。理论和实验结果表明：引入脊形台面和隔离沟道后，激光器阵列的输出功率、电光转换效率、斜率效率和光谱特性均有显著提高。随着沟道的加深，对电流侧向扩散的限制作用增强，从而提高了阵列性能。
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| 关 键 词： | 半导体激光器线阵列 隔离沟道 腐蚀深度 电流扩散 电流分布 |
| 收稿时间： | 1900-01-01; |
Design of 808 nm high power diode laser bars |
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| Yang Ye,Liu Yun,Qin Li,Wang Ye,Liang Xuemei,Li Zaijin,Hu Liming,Shi Jingjing,Wang Chao,Wang Lijun.Design of 808 nm high power diode laser bars[J].High Power Laser and Particle Beams,2011,23(1). |
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| Authors: | Yang Ye Liu Yun Qin Li Wang Ye Liang Xuemei Li Zaijin Hu Liming Shi Jingjing Wang Chao Wang Lijun |
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| Affiliation: | 1. Key Laboratory of Excited States Processes, Changchun Institute of Optics, Fine Mechanics and Physics. Chinese Academy of Sciences, Changchun 130033, China；2. Graduate University of Chinese Academy of Sciences, Beijing 100039， China |
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| Abstract: | Laser bars with 808 nm wavelength are designed and fabricated based on GaAs/AlGaAs graded-index waveguide separate confinement hetero structure single quantum well chip.The enhancement in output power,electro-optical conversion efficiency,slope efficiency and spectral properties has been observed in the laser bars with ridge tops and recesses,which can limit the injection current into the active region.The restrictions in lateral diffusion of the current are enhanced with the deepening of the recess,thus im... |
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| Keywords: | semiconductor laser bar recess etching depth current expansion current distribution |
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