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Nano and micro structural studies of thin films of ZnO
Authors:Harish Bahadur  S B Samanta  A K Srivastava  K N Sood  R Kishore  R K Sharma  A Basu  Rashmi  M Kar  Prem Pal  Vivekanand Bhatt  Sudhir Chandra
Affiliation:(1) National Physical Laboratory, Dr. K.S. Krishnan Road, New Delhi, 110012, India;(2) Centre for Applied Research in Electronics, Indian Institute of Technology Delhi, Hauz-Khas, New Delhi, 110016, India
Abstract:Zinc oxide thin films grown by sol–gel and RF sputtering methods have been characterized. The characterization techniques used involve ellipsometry, optical absorption, scanning tunneling microscopy, scanning and transmission electron microscopy. The films grown by sol–gel spin method which followed zinc acetate route exhibited a smoother texture than the films, which were deposited by using zinc nitrate route. The later type of films showed a dendritic character. Nano-structured fine grains of size ranging from 20 to 60 nm were observed with zinc nitrate precursor film. Individual grains show a sharp contrast with different facets and boundaries. Crystal planes and lattice parameters calculated by electron diffraction and X-ray diffraction are quite close and in agreement with the reported values in literature. Scanning tunneling microscopy has been used for measuring the average roughness of the surface and estimating the lattice constants. The STM studies of RF sputtered films, although showing a ZnO structure, exhibited a disturbed lattice. This was presumably due to the fact that after deposition the films were not annealed. Nanographs of 2D and 3D view of atomic positions of ZnO have been presented by using scanning tunneling microscopy.
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