| 光学薄膜领域反应磁控溅射技术的进展 |
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| 引用本文： | 闫宏,赵福庭.光学薄膜领域反应磁控溅射技术的进展[J].光学仪器,2004,26(2):109-114. |
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| 作者姓名： | 闫宏 赵福庭 |
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| 作者单位： | 北京电影机械研究所,北京,100026;北京电影机械研究所,北京,100026 |
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| 摘 要： | 光学薄膜领域应用反应磁控溅射技术已有多年,反应磁控溅射对提高薄膜质量及降低工艺成本的作用,已受到业界的重视,正在进入工业生产之中。对光学薄膜领域中反应磁控溅射技术中的相关问题进行了评述,提出了一种可能的方案。
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| 关 键 词： | 反应磁控溅射 光学薄膜 滤光片 |
| 文章编号： | 1005-5630(2004)02-0109-06 |
| 修稿时间： | 2003年11月30 |
Advances in reactive magnetron sputtering (RMS) applied on optical coating |
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| YAN Hong,ZHAO Fu-ting.Advances in reactive magnetron sputtering (RMS) applied on optical coating[J].Optical Instruments,2004,26(2):109-114. |
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| Authors: | YAN Hong ZHAO Fu-ting |
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| Abstract: | Reactive magnetron sputtering (RMS) has been applied in the field of optical coating for many years.A lot of attention has been paid by optical coating manufacutures on RMS due to its function of enhancing the quality of optical thin films with lower cost.RMS is now entering industrial production. The paper describes some progress in RMS and shows a possible strategy for rebuild an old-version evaporation coater to a RMS plant. |
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| Keywords: | RMS optical coating optical filter |
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