| 离子注入机靶室尘埃污染与系统改造 |
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| 引用本文： | 陈毅功. 离子注入机靶室尘埃污染与系统改造[J]. 电子工业专用设备, 2002, 31(2): 103-105 |
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| 作者姓名： | 陈毅功 |
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| 作者单位： | 深圳外贸中心深圳科鹏微电子有限公司,广东深圳,518004 |
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| 摘 要： | 讨论了离子注入机尘埃污染的原因 ,给出了用冷凝泵系统取代扩散泵系统的改造实践 ,并提出了预防维修措施以全面减少尘埃污染。
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| 关 键 词： | 离子注入机 尘埃 污染 |
| 文章编号： | 1004-4507(2002)02-0103-03 |
| 修稿时间： | 2002-04-28 |
Particle Contamination and System Reformation in End Station of Ion Implanter |
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| CHEN Yi gong. Particle Contamination and System Reformation in End Station of Ion Implanter[J]. Equipment for Electronic Products Marufacturing, 2002, 31(2): 103-105 |
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| Authors: | CHEN Yi gong |
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| Abstract: | This paper discusses the causes of particle contamination in end station of ion implanter. A useful reformation that substitute CTI-CRYO pump system instead of oil diffusion pump system is reported. To reduce particle contamination effectively , it is important that execute preventive maintenance methods. |
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| Keywords: | Ion Implanter particle Contamination |
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