Manufacturing and testing of a cubic SiC surface |
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Authors: | Feng Yan Di Fan Binzhi Zhang Longhai Yin Ruigang Li Xuejun Zhang |
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Affiliation: | 1. Optical Technology Research Center,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 130033,China;Graduate University of Chinese Academy of Sciences,Beijing 100049,China 2. Optical Technology Research Center,Changchun Institute of Optics,Fine Mechanics and Physics,Chinese Academy of Sciences,Changchun 130033,China |
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Abstract: | The free surface and unrotational-symmetric surface optical elements have been applied more and more widely along with the development of optical design technology,although they are still difficult for manufacturing. In this letter,a SiC unrotational-symmetric aspheric surface whose surface equation is z=3λ(x3 + y3) (λ=0.6328 μm) has been introduced.The tilt abstraction is adopted to minimize the ma terial removal.The surface figures arc peak-to-valley (PV) value of 0.327λ and root-mean-square (RMS)value of 0.023λ.A non-null testing method based on digital mask is proposed to test this surface.The accuracy of the method is testified by the experiment of standard sphere testing. |
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