氧化钒热敏薄膜的制备及其性质的研究

报道一种制备氧化钒热敏薄膜的新方法。采用离子束溅射V2O5粉末靶淀积和氮氢混合气体热处理相结合的薄膜技术，可制备热敏性能较好的低价氧化钒薄膜VOx(x＜2.5)。对不同温度退火后氧化钒薄膜在10－100℃范围内测定了薄层电阻随温度的变化，得到的电阻温度系数（TCR）值为（－1～－4）％K^-1。研究结果表明通过这种方法可在较低温度下制备氧化钒薄膜，这种薄膜具有较低的电阻率和较高的TCR值，可作为非致冷红外微测辐射热计的热敏材料。

PREPARATION AND CHARACTERIZATION OF THERMALLY SENSITIVE VANADIUM OXIDE FILMS

A new method of preparation of vanadium oxide films was reported.A thin VO x(x<2.5) film with good thermal sensitivity was prepared by ion beam sputtering of a V 2O 5 powder target and with a subsequent reduction annealing in mixing gas of N 2+H 2. The VO x(x<2.5) film has a negative temperature coefficient of resistance (TCR) of (-1~-4)%K -1 ,and an activation energy of 0.078eV~0.110eV. The relatively high TCR as well as low formation temperature shows that the film prepared by the new method is promising for application as thermal sensor material in an uncooled IR microbolometer.