| 基底温度对Ag-MgF2金属陶瓷薄膜内应力的影响 |
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| 引用本文： | 李爱侠,孙大明,孙兆奇,宋学萍,赵宗彦. 基底温度对Ag-MgF2金属陶瓷薄膜内应力的影响[J]. 复合材料学报, 2004, 21(2): 22-26 |
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| 作者姓名： | 李爱侠 孙大明 孙兆奇 宋学萍 赵宗彦 |
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| 作者单位： | 安徽大学物理系, 合肥230039 |
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| 基金项目： | 国家自然科学基金，安徽省自然科学基金，安徽省教育厅科研项目，59972001，01044901，99JL0024，，， |
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| 摘 要： | 用电子薄膜应力分布测试仪测量了基底温度对Ag-MgF2金属陶瓷薄膜内应力的影响。结果表明:基底温度在300℃~400℃范围内,φ20.4mm选区内的薄膜平均应力最小,应力分布比较均匀,应力为张应力。XRD分析表明:当基底温度在300℃~400℃范围内,Ag-MgF2薄膜中的Ag和MgF2组分的晶格常数接近块体值,说明通过改变基底温度可以降低薄膜内应力。
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| 关 键 词： | Ag-MgF2金属陶瓷薄膜 应力 基底温度 微结构 |
| 文章编号： | 1000-3851(2004)02-0022-05 |
| 收稿时间： | 2002-12-20 |
| 修稿时间： | 2003-04-03 |
EFFECT OF SUBSTRATE TEMPERATURE ON RESIDUAL STRESS IN Ag-MgF2 CERMET FILMS |
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| LI Aixia,SUN Daming,SUN Zhaoqi,SONG Xueping,ZHAO Zongyan. EFFECT OF SUBSTRATE TEMPERATURE ON RESIDUAL STRESS IN Ag-MgF2 CERMET FILMS[J]. Acta Materiae Compositae Sinica, 2004, 21(2): 22-26 |
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| Authors: | LI Aixia SUN Daming SUN Zhaoqi SONG Xueping ZHAO Zongyan |
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| Affiliation: | Department of Physics, Anhui University, Hefei 230039,China |
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| Abstract: | This paper has investigated the effect of substrate temperature on the residual stress and microstructure of Ag-MgF2 cermet films prepared by vapor deposition. X-ray diffraction (XRD) technique was employed to study the microstructure of the films. The results show that the average stress over a φ20.4 mm round area is the least and the residual stress of the films appears to be tensile stress between 300℃ and 400℃. Crystal lattice constants of Ag and MgF2 both approach the bulk values. The residual stress of the films can be decreased by altering the substrate temperature. |
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| Keywords: | Ag-MgF_2 film stress substrate temperature microstructure |
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