| Mo缓冲层在溅射ZnO薄膜中的应用 |
| |
| 引用本文： | 吴思诚,王旋,范海波,郑新亮,姚合宝,赵宝华.Mo缓冲层在溅射ZnO薄膜中的应用[J].中国钼业,2012,36(5):37-40. |
| |
| 作者姓名： | 吴思诚 王旋 范海波 郑新亮 姚合宝 赵宝华 |
| |
| 作者单位： | 1. 西北大学物理学系,陕西西安,710069
2. 金堆城钼业股份有限公司技术中心,陕西西安,710077 |
| |
| 摘 要： | ZnO薄膜材料作为一种新兴的材料,在半导体光电子领域有着广泛的应用前景。本文利用磁控溅射法在Si衬底上先生长一层Mo缓冲层,然后在Mo缓冲层上制备ZnO薄膜。通过性能对比发现,Mo缓冲层对于ZnO的结晶性能和发光性能的提高具有明显的改善作用。
|
| 关 键 词： | 磁控溅射 ZnO薄膜 Mo薄膜 缓冲层 |
THE APPLICATION OF Mo BUFFER LAYER IN SPUTTERING ZnO THIN FILMS |
| |
| WU Si-cheng
,
WANG Xuan
,
FAN Hai-bo
,
ZHENG Xin-liang
,
YAO He-bao
,
ZHAO Bao-hua.THE APPLICATION OF Mo BUFFER LAYER IN SPUTTERING ZnO THIN FILMS[J].China Molybdenum Industry,2012,36(5):37-40. |
| |
| Authors: | WU Si-cheng WANG Xuan FAN Hai-bo ZHENG Xin-liang YAO He-bao ZHAO Bao-hua |
| |
| Affiliation: | 1.Department of Physics,Northwest University,Xi’an 710069,Shaanxi,China)(2.Technical Center,Jinduicheng Molybdenum Co.,Ltd.,Xi’an 710077,Shaanxi,China) |
| |
| Abstract: | As a new material,ZnO thin film material has a wide range of applications in the semiconductor photoelectric industry.By using the magnetron sputtering method,a layer of Mo buffer layer is grown on Si substrate,and then ZnO film is grown on it.Compared with the ZnO film which has been directly grown on the Si substrate,the crystal quality and optical property are improved by Mo buffer layer. |
| |
| Keywords: | magnetron sputtering ZnO film Mo film buffer layer |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
|
