Monolithically-integrated optoelectronic circuit for ultrafast sampling of a dual-gate field-effect transistor |
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Authors: | J. Allam N. de B. Baynes J. R. A. Cleaver K. Ogawa T. Mishima I. Ohbu |
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Affiliation: | (1) Hitachi Cambridge Laboratory, Hitachi Europe Limited, Cambridge, UK;(2) Cavendish Laboratory, Microelectronics Research Centre, University of Cambridge, Madingley Road, CB3 0HE Cambridge, UK;(3) Central Research Laboratory, Hitachi Ltd, Higashi-koigakubo, 185 Kokubunji-shi, Tokyo, Japan |
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Abstract: | An integrated optoelectronic circuit for ultrafast sampling of multi-terminal devices is described. This is achieved using optimized photoconductive switches fabricated from low-temperature-grown GaAs, monolithic integration of the device with the sampling circuit, control of the electromagnetic modes propagating on the coplanar waveguide using microfabricated airbridges, and discrimination of guided and freely-propagating modes using a novel electrooptic sampling method. As an example, the scattering parameters associated with the propagation of a picosecond pulse through one of the gates of a dual-gate heterojunction field-effect transistor are obtained at frequencies up to 300 GHz. The inter-gate capacitance is determined by measuring the electromagnetic transient coupled between the gates. |
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