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Effect of Oxygen Flow Rate on Structural,Electrical and Optical Properties of Zinc Aluminum Oxide Thin Films Deposited by DC Magnetron Sputtering |
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| Authors: | Kumar B. Rajesh Hymavathi B. |
| Affiliation: | 1.Department of Physics, Gandhi Institute of Technology and Management (GITAM), 530045, Visakhapatnam, Andhra Pradesh, India ;2.Department of Physics, Anil Neerukonda Institute of Technology and Sciences (Autonomous), 531162, Sangivalasa, Visakhapatnam, Andhra Pradesh, India ; |
| Abstract: | Semiconductors - Zinc Aluminum Oxide thin films were deposited on glass substrates by reactive DC magnetron sputtering method by varying oxygen flow rates from 1 to 4 sccm. Glancing angle X-ray... |
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