| IC卡E^2PROM单元写／擦特性的测试与研究 |
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| 引用本文： | 陈宇川 朱钧. IC卡E^2PROM单元写／擦特性的测试与研究[J]. 微电子学与计算机, 1997, 14(2): 1-4 |
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| 作者姓名： | 陈宇川 朱钧 |
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| 作者单位： | 清华大学微电子所!北京，100084 |
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| 摘 要： | 针对金卡工程中EEPROM单元的可靠性问题，本文给出了可以对其编程窗口进行测试和分析的测试系统的软、硬件描述。根据对测试结果的分析与讨论，得到了最佳的单元尺寸和编程条件。
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| 关 键 词： | EEPROM 测试系统 编程窗口 FN隧道效应 |
Testing and Analyzing of the Write/Erase Characteristics of E~2PROM Cells Used in the IC Card |
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| Chen Yuchuan, Zhu Jun. Testing and Analyzing of the Write/Erase Characteristics of E~2PROM Cells Used in the IC Card[J]. Microelectronics & Computer, 1997, 14(2): 1-4 |
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| Authors: | Chen Yuchuan Zhu Jun |
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| Abstract: | In accordance with the reliability issues of the EEPROM cells that are used in the IC Card, this paper describes the hardware and software of the test system, which is developed to test and analyze the programming windows of the cells. According to the analyses and discussions of the results of the test, the optimized sizes and program conditions can be obtained. |
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| Keywords: | EEPROM Test system Programming window FN tunneling effect |
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