| 脉冲电弧沉积类金刚石薄膜的厚度建模 |
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| 引用本文： | 刘缠牢,吴玲玲,梁海锋,蔡长龙. 脉冲电弧沉积类金刚石薄膜的厚度建模[J]. 真空, 2005, 42(6): 33-35 |
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| 作者姓名： | 刘缠牢 吴玲玲 梁海锋 蔡长龙 |
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| 作者单位： | 西安工业学院薄膜技术与光学检测重点实验室,陕西,西安,710032 |
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| 摘 要： | 从理论和实验出发,分析脉冲电弧源的放电机理,讨论了脉冲电弧源发散特性,得到影响膜厚空间分布的主要因素,建立膜厚空间分布和主要因素之间的数学模型,结果表明和实验数据吻合.
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| 关 键 词： | 脉冲电弧 发散特性 数学模型 |
| 文章编号： | 1002-0322（2005）06-0033-03 |
| 收稿时间： | 2005-05-11 |
| 修稿时间： | 2005-05-11 |
Thickness modeling of diamond-like carbon films by pulsed vacuum arc deposition |
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| LIU Chan-lao,WU Ling-ling,LIANG Hai-feng,CAI Chang-long. Thickness modeling of diamond-like carbon films by pulsed vacuum arc deposition[J]. Vacuum(China), 2005, 42(6): 33-35 |
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| Authors: | LIU Chan-lao WU Ling-ling LIANG Hai-feng CAI Chang-long |
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| Affiliation: | Key Laboratory of Film Technology and Optical Measurement, Xian Institute of Technology, Xian 710032, China |
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| Abstract: | Discusses theoretically and experimentaly the discharge mechanicsm and diverging feature of pulsed arc source,thus obtaining the main influencing factors on the films' thickness.Then,a mathematical model is developed between the main influencing factors and films' thickness.The solution to the model shows its conformity with experimental results. |
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| Keywords: | pulsed arc films' thickness mathematical model |
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