| 卤离子对化学沉积镍的影响 |
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| 引用本文： | 韩克平,方景礼.卤离子对化学沉积镍的影响[J].电化学,1996,2(2):198-201. |
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| 作者姓名： | 韩克平 方景礼 |
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| 作者单位： | 南京大学化学系应用化学研究所 |
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| 摘 要： | 用重量法测定了卤离子对化学沉积镍速度的影响．并借助电化学方法研究了卤离子对镍的化学沉积过程的极化曲线和稳定电位的影响．探讨了卤离子加速和稳定化学沉积镍的机理
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| 关 键 词： | 化学沉积镍 卤离子 电化学方法 |
| 收稿时间： | 1996-05-28 |
Effect of Halide Ions on the Deposition of Electroless Nickel |
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| Han Keping,Fang Jingli.Effect of Halide Ions on the Deposition of Electroless Nickel[J].Electrochemistry,1996,2(2):198-201. |
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| Authors: | Han Keping Fang Jingli |
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| Abstract: | The effect of halide ions on the polarization curves and stationary potential of electroless nickel plating process were studied with electrochemical methods. The acceleration and stabilization mechanism of electroless nickel deposition by halide ions also has been discussed. |
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| Keywords: | Electroless nickel deposition Halide ions Electrochemical methods |
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