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On the Growth of Thin-Film AlGaN/GaN Epitaxial Heterostructures on Hybrid Substrates Containing Layers of Silicon Carbide and Porous Silicon
Authors:Seredin  P V  Radam  Ali Obaid  Goloshchapov  D L  Len’shin  A S  Buylov  N S  Barkov  K A  Nesterov  D N  Mizerov  A M  Timoshnev  S N  Nikitina  E V  Arsentyev  I N  Sharafidinov  Sh  Kukushkin  S A  Kasatkin  I A
Affiliation:1.Voronezh State University, 394018, Voronezh, Russia
;2.Ural Federal University named after the first President of Russia B.N. Yeltsin, 620002, Yekaterinburg, Russia
;3.Voronezh State University of Engineering Technologies, 394036, Voronezh, Russia
;4.Federal State Budgetary Institution of Higher Education and Science “St. Petersburg National Research Academic University,” Russian Academy of Sciences, 194021, St. Petersburg, Russia
;5.Ioffe Institute, 194021, St. Petersburg, Russia
;6.Institute for Problems of Mechanical Engineering, Russian Academy of Sciences, 199178, St. Petersburg, Russia
;7.St. Petersburg State University, 199034, St. Petersburg, Russia
;
Abstract:Semiconductors - Abstract—In our work, we carry out a structural-spectroscopic study of AlGaN/GaN epitaxial layers grown by molecular-beam epitaxy with nitrogen-plasma activation on a hybrid...
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