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离子束辅助轰击对电弧离子镀沉积TiAlN膜层的影响
引用本文:吕树国,刘常升,李玉海,张罡,毕监智,金光. 离子束辅助轰击对电弧离子镀沉积TiAlN膜层的影响[J]. 腐蚀科学与防护技术, 2009, 21(3)
作者姓名:吕树国  刘常升  李玉海  张罡  毕监智  金光
作者单位:东北大学材料与冶金学院,沈阳,110004;沈阳理工大学中俄联合高能束流实验室,沈阳,110168;东北大学材料与冶金学院,沈阳,110004;沈阳理工大学中俄联合高能束流实验室,沈阳,110168
基金项目:科技部国际合作重点项目 
摘    要:采用俄罗斯UVN 0.5D2I离子束辅助电弧离子镀沉积设备,在高速钢W18Cr4V基材上沉积TiAlN膜层;利用N离子束对膜层沉积之前的预处理和膜层沉积时的辅助轰击,并用SEM、X射线衍射和力学测试等手段研究了N离子束轰击对膜层表面形貌、相结构、显微硬度影响.结果表明:N离子束的预处理在基材表面形成了一定厚度N的过渡层;N离子束对膜层的辅助轰击,明显地降低了膜层表面"大颗粒"的密度,改善了膜层的表面形貌;同时,形成了由过渡层成分与膜层成分动态混合的扩散层;无N离子轰击时,TiAlN膜层是由(TiAl)N相和Ti2AlN相组成;轰击能量为7.5 keV时,TiAlN膜层也是由(TiAl)N相和Ti2AlN相组成,但(TiAl)N(111)取向减弱,而(200)和(220)取向均增强;Ti2AlN(211)及(301)取向均减弱.N离子束辅助轰击,使膜层的显微硬度由原来的21 GPa提高到25.3 GPa.

关 键 词:离子束  TiAlN膜层  电弧离子镀  显微硬度  表面形貌

EFFECT OF ION BEAM ASSISTED BOMBARDMENT ON TiAlN COATINGS DEPOSITED BY ARC ION PLATING
LV Shu-guo,LIU Chang-sheng,LI Yu-hai,ZHANG Gang,BI Jian-zhi,JIN Guang. EFFECT OF ION BEAM ASSISTED BOMBARDMENT ON TiAlN COATINGS DEPOSITED BY ARC ION PLATING[J]. Corrosion Science and Protection Technology, 2009, 21(3)
Authors:LV Shu-guo  LIU Chang-sheng  LI Yu-hai  ZHANG Gang  BI Jian-zhi  JIN Guang
Affiliation:LV Shu-guo1,2,LIU Chang-sheng1,LI Yu-hai2,ZHANG-Gang2,BI Jian-zhi2,JIN Guang21.Department of Material , Metallurgy,Northeastern University,Shenyang 110004,2.Sino-Russia Joint Laboratory of High Energy Beams,Shenyang Ligong University,Shenyang 110168
Abstract:TiAlN coatings were deposited on W18Cr4V steel by Russia UVN 0.5 D2I ion beam assisted arc ion plating facility.The effect of N ion beam bombarding before and during coating deposition on its morphology,phase structure and micro hardness of deposited coatings was studied.SEM observation revealed that a transition layer on substrate surface was formed by N ion beam pretreatment,the density of large particles on coating surface was decreased obviously,and a dynamic mixing diffusion layer was formed by N ion b...
Keywords:ion beam bombard  TiAlN coatings  arc ion plating  micro hardness  surface morphology  
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