Statistics of mesoplasma channel formation upon thermal breakdown stabilization in thin semiconductor films

A phenomenological model of the development of thermal breakdown in semiconductor films is considered, and it is shown that the average number of mesoplasma channels experimentally observed in the regime of thermal breakdown stabilization can substantially vary. The probability distribution function for the number of such luminous channels arising as a result of thermal fluctuations in a thin semiconductor film is calculated within the framework of a simple approximation.