| 真空中的基板加热温度检测 |
| |
| 引用本文： | 石晓倩,郭方准. 真空中的基板加热温度检测[J]. 真空电子技术, 2022, 0(1) |
| |
| 作者姓名： | 石晓倩 郭方准 |
| |
| 作者单位： | 大连交通大学机械工程学院 |
| |
| 基金项目： | 辽宁省教育厅“攀登学者”项目。 |
| |
| 摘 要： | 在真空环境中进行原子级别的薄膜生长,基板的表面温度监控是关键技术之一。针对不同尺寸的基板,通过热电偶测试基板近旁的温度和红外测温仪测试基板表面的温度,经过数据拟合获得两种测试方法所得温度的对应关系,基板表面的温度与近旁温度存在偏差,但两者之间存在较好的线性比例关系。
|
| 关 键 词： | 真空加热 薄膜制备 真空温度 热辐射 电子轰击 |
Measuring of Substrate Heating Temperature in Vacuum |
| |
| SHI Xiao-qian,GUO Fang-zhun. Measuring of Substrate Heating Temperature in Vacuum[J]. Vacuum Electronics, 2022, 0(1) |
| |
| Authors: | SHI Xiao-qian GUO Fang-zhun |
| |
| Affiliation: | (School of Mechanical Engineering,Dalian Jiaotong University,Dalian 116028,China) |
| |
| Abstract: | The monitoring and controlling of substrate surface temperature is one of the key technologies to grow atomic-scale thin films in vacuum. For substrates withdifferent size, the temperatures near and of the substrate surface were measured by thermocoupleand infrared thermometer respectively.The corresponding relationship between the two temperatures was obtained by data fitting. The result shows thatthere is a deviation between the two temperatures, but the linear proportional relationship is good. |
| |
| Keywords: | Vacuum heating Thin film preparation Vacuum temperature Thermal radiation Electron bombardment |
| 本文献已被 维普 等数据库收录！ |
|
