脉冲激光和磁控溅射沉积Mo薄膜研究

采用脉冲激光（PLD）和磁控溅射（MS）沉积技术制备了Mo薄膜，用扫描电镜（SEM）、白光干涉仪和X射线衍射仪（XRD）分别表征了薄膜的表面形貌和组织、表面粗糙度和薄膜密度。结果表明，PLD沉积的Mo的表面形貌受脉冲能量和基体温度的影响较大，能量越高、表面缺陷增多。MS沉积的Mo薄膜较致密，呈典型的柱状生长行为。PLD秽MS沉积的Mo薄膜的表面粗糙度均较好，R小于20nm。对实验结果进行了讨论。

Study on Mo Films Deposited by Using Pulse Laser and Magnetron Sputtering Techniques

The PLD and MS techniques were employed to prepare the Mo films,of which the surface morphology and cross section stucture.film thickness and surface roughness.and film density were characterized by using SEM.white light interfer- ometer and XRD respectively. The results indicate that the surface morphology and structure of the Mo flims deposited by PLD are dependence of the pulse energy and substrate temperature. The higher the energy are,the more defect of the Mo surface. As the evelated temperature. The Mo films by MS are dense and appear typically columnar growth. All of the films by PLD and MS have a good surface roughness of the Rq values less than 20nm and are consistent uniformity in thickness. Also, the exprimental results are discussed.